| 摘要 |
PROBLEM TO BE SOLVED: To prevent an improperly exposed photosensitive substrate from being sent to the next treatment process. SOLUTION: A stage controller 76-1 successively monitors the position coordinates of a substrate stage 64 through an interferometer 56 during exposure and, at the same time, judges whether or not the deviation of the present position coordinates of the stage 64 from target coordinates falls within a tolerance at the time of exposure based on the monitored results and, when the deviation exceeds the tolerance, outputs an abnormality signal. Therefore, it becomes possible to urgently stop an exposing device based on the abnormality signal and a photosensitive substrate 52 which is improperly exposed owing to the position error of the stage 64 can be removed quickly. In addition, the exposing device can be corrected or adjusted simultaneously with the removal of the improperly exposed photosensitive substrate. |
