Method of analysing failure or faults in measured semiconductor device

摘要

The method involves setting a pre-determined two-dimensional position to a coordinate origin in the measured device (S1). An emission image is formed on operating the measured device using an emission analyser for detecting the emitting part of the measured device according to the emission imaging. The method further involves identifying emitted coordinates of the measured device which are the coordinates of the emitting region, from the coordinate origin with the position relationship between the emission image and the coordinate origin.