| 摘要 |
<p>A process for fabricating an electrical terminal (48) having an integral capacitor (50) formed on the exterior of the terminal includes a laser ablation process for deposition of a thin layer of dielectric material (44) on to the body of the terminal (48). An outer electrode (46) is then deposited on the exterior of the dielectric layer and the terminal can be used in a filtered electrical connector. A wire (2) can be cleaned by, for example, a plasma cleaning step prior to the deposition of the dielectric layer (44) by laser ablation and lasers (12) can be used to anneal at least the outer portion of the additively deposed dielectric layer (44). The wire (2) can be rotated to provide complete coverage.</p> |
