| 摘要 |
PROBLEM TO BE SOLVED: To easily remove foreign matters which firmly deposit on a mask without using hazardous chemicals by arranging an ozone water cleaning part, ice scribe cleaning part, ultrasonic cleaning part and warm water drawing and drying part. SOLUTION: A photomask set on a loader 10 is successively sent to an ozone water tank of an ozone cleaning part 11 and dipped for about 5 to 10min to carry out ozone water cleaning. Then the photomask is sent to an ice scribe cleaning part 12 where the mask is subjected to ice scribe cleaning for about 1 to 5min. Then the mask is sent to an ultrasonic cleaning part 13 where the mask is cleaned by ultrasonic waves of MHz frequencies for 5 to 10min in pure water in a ultrasonic cleaning device. Then the mask is subjected to warm water drawing and drying in a warm water drawing and drying part 14. Namely, an org. matter on the mask surface is removed by ozone water cleaning, a foreign matter having strong adhesion force is removed by ice scribe cleaning, and a foreign matter in a submicron size is removed by ultrasonic cleaning with pure water. Thus, foreign matters can be removed only by cleaning with water, which improves safeness and economic advantages. |
