发明名称 PROCESS FOR OPTIMIZING THE ADHESION BETWEEN MOLDABLE MATERIAL AND A PASSIVATION LAYER
摘要 This invention concerns a process for optimizing the adhesion in a plastic chip housing between the moldable material and the second organic passivation layer of polyimide. To that effect, a plasma-etching process with oxygen is additionally applied. In this way, the surface of the polyimide is essentially roughened. Use of a photosensitive polyimide is particularly advantageous because this eliminates the need to use an additional mask.
申请公布号 WO9809330(A1) 申请公布日期 1998.03.05
申请号 WO1997DE01830 申请日期 1997.08.22
申请人 SIEMENS AKTIENGESELLSCHAFT;ATZESDORFER, ALEXANDRA;NIEDERLE, CHRISTL;HOUDEAU, DETLEF 发明人 ATZESDORFER, ALEXANDRA;NIEDERLE, CHRISTL;HOUDEAU, DETLEF
分类号 H01L23/31 主分类号 H01L23/31
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