发明名称 SILICA WITH LOW COMPACTION UNDER HIGH ENERGY IRRADIATION
摘要 Fused silica stepper lens for photolithographic application are disclosed which are resistant to laser-induced damage, specifically, compaction or densification which can lead to an increase in the optical path length of the lens. The figure compares the phase front distortions of a standard fused silica with the phase front distortions observed in two inventive stepper lens fused silica.
申请公布号 WO9808775(A1) 申请公布日期 1998.03.05
申请号 WO1997US15233 申请日期 1997.08.27
申请人 CORNING INCORPORATED;BORRELLI, NICHOLAS, F.;SEWARD, THOMAS, P.;SMITH, CHARLENE 发明人 BORRELLI, NICHOLAS, F.;SEWARD, THOMAS, P.;SMITH, CHARLENE
分类号 G02B1/00;C03B8/02;C03B8/04;C03B19/06;C03B19/10;C03B19/14;C03B20/00;C03C1/00;C03C3/06;C03C23/00;G02B1/02;G03F7/20;(IPC1-7):C03C3/06 主分类号 G02B1/00
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