| 摘要 |
<p>A substrate treatment system for treating a substrate under an air-conditioned environment comprises process sections (11, 220) provided with at least either of liquid treatment system units (G1, G2, 171, 172, 241 to 244) and heat treatment system units (G3, G4, 245-248), an upper spaces (62, 262) formed above the process sections in order to supply air to the process sections, purification sections (80, 281, 281A) for removing alkaline components from the air to be supplied to the upper spaces to purify the air, temperature and humidity control sections (140, 301) communicating with the purification sections and the upper spaces to control the temperature and humidity of the air passing through the purification sections, and fans (151, 152, 174, 184, 263, 307) for supplying air to the upper spaces from the temperature and humidity control sections, lowering the air from the upper spaces into the process sections, and supplying at least some of the air lowering through the process sections to the temperature and humidity control sections. The purification sections (80, 281, 281A) are provided with chambers (81, 282) communicating with a clean room, air replenishment means (82, 109, 151, 283A, 307) for introducing a supplementary air into the chambers from the clean room, nozzles (92, 102, 106, 108, 285) for spraying demineralized water into the chambers, gas-liquid contact sections (90, 100, 298, 299) formed in the chambers in order to bring the sprayed demineralized water into contact with the introduced supplementary air, and mist trap mechanisms (91, 94, 101, 104, 291) arranged at the downstream side of the gas-liquid contact sections to capture the mist-like demineralized water in the air passing through the gas-liquid contact sections. <IMAGE></p> |
