发明名称 |
Negative resist composition |
摘要 |
<p>A negative resist composition comprising an alkaline-soluble resin containing a polyvinylphenol resin whose phenolic hydroxyl group is partially alkyl-etherified, a sulfonate of a N-hydroxyimide compound as an acid generator, and a crosslinking agent, wherein a dispersion degree of the polyvinylphenol resin determined by gel permeation chromatography is within the range from 1.01 to 2, and using the negative resist composition, resolution and profile are improved.</p> |
申请公布号 |
EP0827025(A1) |
申请公布日期 |
1998.03.04 |
申请号 |
EP19970114663 |
申请日期 |
1997.08.25 |
申请人 |
SUMITOMO CHEMICAL COMPANY, LIMITED |
发明人 |
SUETSUGU, MASUMI;KUSUMOTO, TAKEHIRO;TAKEYAMA, NAOKI |
分类号 |
C08K5/36;C08K5/42;C08L25/18;G03F7/004;G03F7/038;H01L21/027;(IPC1-7):G03F7/038 |
主分类号 |
C08K5/36 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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