发明名称 Negative resist composition
摘要 <p>A negative resist composition comprising an alkaline-soluble resin containing a polyvinylphenol resin whose phenolic hydroxyl group is partially alkyl-etherified, a sulfonate of a N-hydroxyimide compound as an acid generator, and a crosslinking agent, wherein a dispersion degree of the polyvinylphenol resin determined by gel permeation chromatography is within the range from 1.01 to 2, and using the negative resist composition, resolution and profile are improved.</p>
申请公布号 EP0827025(A1) 申请公布日期 1998.03.04
申请号 EP19970114663 申请日期 1997.08.25
申请人 SUMITOMO CHEMICAL COMPANY, LIMITED 发明人 SUETSUGU, MASUMI;KUSUMOTO, TAKEHIRO;TAKEYAMA, NAOKI
分类号 C08K5/36;C08K5/42;C08L25/18;G03F7/004;G03F7/038;H01L21/027;(IPC1-7):G03F7/038 主分类号 C08K5/36
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