| 发明名称 |
Photosensitive resin composition |
| 摘要 |
<p>There is disclosed a positive type photosensitive resin composition which comprises an alkali-soluble polymer (A) having a carboxyl group and/or a phenolic hydroxyl group, and a compound (B) which forms an amine compound with irradiation of light.</p> |
| 申请公布号 |
EP0622682(B1) |
申请公布日期 |
1998.03.04 |
| 申请号 |
EP19940302204 |
申请日期 |
1994.03.28 |
| 申请人 |
HITACHI CHEMICAL CO., LTD. |
发明人 |
HAGIWARA, HIDEO;KAJI, MAKOTO;KOJIMA, YASUNORI |
| 分类号 |
G03F7/004;(IPC1-7):G03F7/004 |
主分类号 |
G03F7/004 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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