| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing device which can prevent dust from dropping onto a substrate and make effective use of the inside space of a device base. SOLUTION: This substrate processing device is provided with a processing unit 3 in which a plurality of processing parts 15 for applying prescribed processing to a substrate are disposed in the vertical direction, formed on a device base 17, and a substrate conveying device 4 for carrying the substrate in/out of the respective processing parts 15. By positioning a base member 18 of the substrate conveying device 4 on the device base 17, forming an extendable elevating mechanism 20 of flexible arm structure or pantograph structure which extends/retracts vertically on the base member 18, and fitting a substrate carrying-in/out structure 21 which carries the substrate in/out of the processing part 15 onto the upper end part of the extendable elevating mechanism 20. It is thus possible to carry the substrate in/out of the processing part 15 at a higher position than the extendable elevating mechanism 20 all the time, and ensure the inside space of the device base 17. |
