发明名称 ANTISTATIC MATERIAL
摘要 PROBLEM TO BE SOLVED: To obtain the subject material having excellent antistatic properties free from reduction in antistatic properties by repeated use, comprising a monomer component containing an acylic acid derivative having a specific structure and/or a polymer composed of the monomer component. SOLUTION: This antistatic material comprises a monomer component containing an acrylic acid derivative of the formula (R1 and R2 are each H or methyl; R3 is H or an organic residue; R4 is H, a counter ion, etc.; (n) is 4-100) [e.g. methylα-(hydroxypolyethyleneoxymethyl)acrlate and/or a polymer composed of the monomer component. The compound is obtained, for example, by reacting a correspondingα-hydroxyalkylacrylic acid ester compound with a cyclic ether compound such as ethylene oxide in the presence of a Lewis acid catalyst. The objective material is obtained. for example, by forming a copolymer comprising a monomer component containing the compound of the formula and acrylonitrile and/or an ethylenic unsaturated compound into a fibrous state.
申请公布号 JPH1060416(A) 申请公布日期 1998.03.03
申请号 JP19960220077 申请日期 1996.08.21
申请人 NIPPON SHOKUBAI CO LTD 发明人 NAGANO HIDEAKI;INAOKA SUSUMU
分类号 C09K3/16;C08G65/08;D01F1/09;D01F6/40;D06M15/263;D06M101/00;D06M101/16;(IPC1-7):C09K3/16 主分类号 C09K3/16
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