发明名称 PRODUCING A LITHOGRAPHIC PRINTING PLATE BY SEQUENTIALLY EXPOSING A THERMO-SENSITIVE IMAGING ELEMENT BY A SET OF RADIATION BEAMS
摘要 PROBLEM TO BE SOLVED: To form a lithographic printing plate by continuous exposure of a thermo-sensitive imaging element by a set of radiation beams. SOLUTION: At any given moment (ta+Δt) during exposure, at least two or more radiation beams (bi, bj) of an emitting beam group impinge on different microdots (ma, ma+Δm) of a scanline (1a) on an imaging element, so that by completion of the exposure step, each effective microdot of the scanline has been impinged by all effective radiation beams of the set.
申请公布号 JPH1058637(A) 申请公布日期 1998.03.03
申请号 JP19970079191 申请日期 1997.03.14
申请人 AGFA GEVAERT NV 发明人 JOHAN VAN HUNSEL;BOSSCHAERTS JACOBUS;VERMEERSCH JOAN;ROBERT OVERMEER;FRED WILLIAM MARLAND
分类号 B41J2/44;B41C1/055;B41C1/10;B41J2/45;B41J2/455;B41M5/26;B41M5/28;B41M5/30;B41M5/323;B41M5/46;B41N1/14;G03C1/20;G03C1/498;G03F5/00;G03F7/00;G03F7/004;G03F7/07;G03F7/20;G03F7/30;H04N1/40;(IPC1-7):B41C1/055 主分类号 B41J2/44
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