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发明名称
CHEMICAL VAPOR DEPOSITION, SPUTTERING APPARATUS AND METHOD THEREFOR
摘要
申请公布号
JPH1060658(A)
申请公布日期
1998.03.03
申请号
JP19970133742
申请日期
1997.05.23
申请人
APPLIED MATERIALS INC
发明人
LITTAU KARL A
分类号
C23C14/16;C23C14/34;C23C14/58;C23C16/20;C23C16/44;C23C16/455;C23C16/50;H01J37/32;H01J37/34;H01L21/203;H01L21/205;H01L21/285;H01L21/768;(IPC1-7):C23C16/50
主分类号
C23C14/16
代理机构
代理人
主权项
地址
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