| 摘要 |
A multi gray scale photo mask, a manufacturing method thereof, and a pattern transfer are provided to implement an effective transmittance for an exposure light by forming the multi gray scale photo mask considering the shape of the resist pattern. A shielding layer(22) shielding the exposure light is formed on a transparent substrate(21). A translucent film(24) transmitting the exposure light partially is pattern-processed. The transfer pattern has a transmitting area, a shielding area, and a translucent area. The translucent area includes a first translucent part for a specific pattern shape and a second translucent part for the different pattern shape. The effective transmissivity for the exposure light is identical in the first translucent part and the second translucent part. The transmittance of the intrinsic film of the translucent film is different.
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