Method of preventing corrosion after etching

摘要

The invention relates to a method of preventing corrosion after etching a film of aluminium or an aluminium alloy, said film having been etched in a reaction chamber containing a chlorinated plasma, followed by a passivation step using a fluorinated plasma, characterized in that a. the chlorinated plasma is removed from the reaction chamber; b. fluorinated gas is introduced into the chamber while a vacuum is maintained in the reaction chamber; c. the chamber is subjected to an RF power suitable for creating a fluorinated plasma to passivate the etched aluminium film.