发明名称 Pattern transfer techniques for fabrication of lenslet arrays using specialized polyesters
摘要 In a method for forming lenslets which collect light and focus it onto photosensitive elements of an electronic imager includes providing a transparent lenslet-forming layer on a substrate or on layers on the substrate, (a) providing a transparent polyester lenslet-forming layer on a substrate or on layer(s) on the substrate, the polyester containing repeat units, in part, having the structure <IMAGE> wherein: n is 2 or greater; x is selected from the group consisting of H, CH3, Br and Cl; and Z is selected from the group consisting of nil, O, S, CH2, C=O, SO, SO2, CH-CH3, CH3-C-CH3, CF3-C-CF3, CH3-C-CH2CH3, <IMAGE> <IMAGE> <IMAGE> (b) forming a thin etch-stop layer on the transparent lenslet-forming layer and patterning the etch-stop layer to form a mask so that the pattern corresponds to lenslets to be formed; (c) anisotropically plasma etching the transparent lenslet-forming layer according to the pattern; (d) removing the thin etch-stop mask; and (e) thermally reflowing the patterned transparent layer to form the transparent lenslets.
申请公布号 US5723264(A) 申请公布日期 1998.03.03
申请号 US19960615938 申请日期 1996.03.14
申请人 EASTMAN KODAK COMPANY 发明人 ROBELLO, DOUGLAS R.;REVELLI, JOSEPH F.;HIRSH, JEFFREY I.
分类号 C08G63/672;G02B3/00;G03F7/00;(IPC1-7):G03F7/40 主分类号 C08G63/672
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