Exposure apparatus of reduced projection scanning type

摘要

An exposure apparatus of a reduced projection scanning type can enlarge the exposure area while preventing enlargement of the exposure optical system. The apparatus includes a plurality of exposure optical systems having the same reduction scale ratio. Each optical system is formed such that the optical axis of the illuminating light and the optical axis of the exposure light are mutually parallel. The exposure area and the illumination area, as viewed from the direction of these optical axes, are mutually shifted so as to have an axis of similarity. The illumination areas of the optical systems are positioned on the same illumination plane. The exposure areas of the optical system are positioned on the same exposure plane. Axes of similarity of the optical systems mutually coincide. The object of illumination is positioned on the illumination plane and the object of exposure is positioned on the exposure plane. These objects are scanned in a mutually parallel manner with a speed ratio in accordance with the reduction scale ratio. The illumination and exposure areas of each optical system are provided so as to be continuous in a direction orthogonal to the direction of scanning the objects of illumination and exposure. <IMAGE>