| 摘要 |
PROBLEM TO BE SOLVED: To obtain excellent polarizing characteristics and reliability without producing bubbles on the surface of a polarizing element by controlling the amt. of impurity gas of the sputtering gas to a specified range in a polarizing layer. SOLUTION: The polarizing element 1 is obtd. by forming a polarizing layer 3 on the principal plane of a dielectric substrate 2 having light-transmitting property. The polarizing plate 3 is formed by alternately depositing metal particles layers 4 having dispersion of many metal particles 4a having dimensional anisotropy, for example, with <=40 particles/μm<2> density on the plane direction of the substrate and dielectric layers 5 having light-transmitting property. The amt. of O-group elements (e.g. Ar, Ne, He) used as the sputtering gas in the polarizing layer 3 is controlled to <=1.5×10<20> molecules/cm<3> . The density of metal particles 4a is the density in the plane direction of the substrate S and is measured on the cross section including the major axis of at least one metal particle 4a (on the plane parallel to the substrate S).
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