| 摘要 |
PROBLEM TO BE SOLVED: To obtain a photosensitive paste containing a specific compound, a photosensitive organic component and inorganic particles as essential components, suppressed in gelation, capable of being thereby stably used, and enabling a pattern processing having high aspect ratio and high precision. SOLUTION: This photosensitive paste contains an amine compound preferably having a primary or secondary amino group (e.g. 2-aminoethanol), a photosensitive organic component (e.g. a composition comprising trimethylolpropane triacrylate, a polymer of the formula, a photopolymerization initiator, and a photosensitizer), and inorganic particles containing glass particles in an amount of >=50wt.%. The amine compound is preferably contained in an amount of 0.01-10wt.% in the paste, and the inorganic particles are preferably coated with the amine compound. The glass particles preferably have a thermal softening temperature of 350-600 deg.C. |
