| 摘要 |
PROBLEM TO BE SOLVED: To make it possible to execute the alignment of electrode pads and fine line patterns of V-grooves with high accuracy by providing the mask with mask patterns for the electrode pads and mask patterns for positioning making a pair therewith. SOLUTION: The first mask 10 for lithography is provided with the mask patterns 12 for the electrode pads for transferring the patterns of the electrode pad and the mask patterns 14 for positioning which are disposed in a pair with there mask patterns 12 for the electrodes and use the V-grooves as the reference for positioning. The respective mask patterns 12, 14 are formed on a supporting plate 16. The mask for lithography having the mask patterns 12 for the electrode pads congruent with the electrode pads to be formed or having the shape analogous therewith and the mask patterns 14 for positioning is used and the alignment of the mask patterns 14 for positioning and the V- groove patterns is executed, by which the alignment of the mask patterns for the electrode parts is executed. |
