PHOTOSENSITIVE RESIN COMOPSITION, PHOTOCURABLE PATTERN FORMED FROM THE SAME AND IMAGE DISPLAY COMPRISING THE PATTERN

摘要

The present invention relates to a photosensitive resin composition. More particularly, the photosensitive resin composition effectively realizes high sensitivity by alleviating oxygen inhibition by comprising a thiol-based additive and a UV absorbing agent within the molecule. The thiol-based additive satisfies a particular parameter value regarding a thiol substituent group, and the UV absorbing agent has a maximum absorption (_max) at a wavelength of 335-365 nm. Also, when applied to a product, the photosensitive resin composition can realize high resolution while suppressing an increase of a line width of patterns.