发明名称 PROJECTION ALIGNER AND MANUFACTURE OF SEMICONDUCTOR DEVICE USING THE SAME
摘要 PROBLEM TO BE SOLVED: To detect a light beam reflected from a reflective surface for a short time at a high accuracy by receiving the light beam through a projection optical system and reference mark with driving a movable stage in the reflective surface inclining direction to obtain an image formed position information, using signals from a photo-detecting element. SOLUTION: A reference mark 50 is placed on a reticle surface 1 or at a position equivalent to the reticle surface, and an inclined reflective surface 12 is placed on a wafer stage 5. The image from the mark 50 is projected on the inclined reflective surface 12 and reflected beam from this surface 12 is guided to a photo-detecting element 103 through the mark 50. The stage 5 with the inclined surface 12 is continuously scanned horizontally in the inclined direction to determine the best image formed plane position of the mark 50 by a focus position detection control means 1100, using signals from the element 103 to calculate the best image formed plane position of an exposure region.
申请公布号 JPH1050593(A) 申请公布日期 1998.02.20
申请号 JP19960220340 申请日期 1996.08.02
申请人 CANON INC 发明人 MIURA KIYONARI
分类号 G03F9/00;G03F7/20;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F9/00
代理机构 代理人
主权项
地址