| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for control in which the position of a mask is controlled with high accuracy. SOLUTION: With a relational expression of coordinate measurement values X, YL, YR, of mask interferometers 14x, 14y1 , 14y2 and position attitude (OX, OY,θ) of a mask stage, and a relational expression of the position attitude of the mask stage and position attitude (BX, YY,ω) of a mask R, the position of the mask R is controlled, based on the measurement values X, YL, YR of the interferometers. the position of the mask R us controlled based on the measurement values X, YL, YR of the interferometers, so that even when the mask stage 11 is rotated a lot, the position of the mask R is based on the measurement values X, YL, YR of the interferometers at this time, controlled with high accuracy. Thereby alignment accuracy is not lowered, even if the rotational amount of the mask stage 11 is large. |
