发明名称 |
Imaging System and Imaging Method |
摘要 |
An imaging system may include a radiation source for emitting radiation, a radiation detector having a regular arrangement of detector elements, and a shadow mask having a regularly repeating pattern. The shadow mask and the radiation detector may be arranged such that a projection of the pattern of the shadow mask is generated at the location of the detector by the radiation. A spatial repetition length of the projection of the pattern may differ from twice a spatial repetition length of the arrangement of the detector elements. Such imaging system may be used, for example, with the aid of the radiation detector, to measure the displacement of the projection of the pattern of the shadow mask at the location of the radiation detector which is effected by an object to be examined. |
申请公布号 |
US2016256122(A1) |
申请公布日期 |
2016.09.08 |
申请号 |
US201415032170 |
申请日期 |
2014.10.22 |
申请人 |
SIEMENS AKTIENGESELLSCHAFT |
发明人 |
Heid Oliver |
分类号 |
A61B6/00 |
主分类号 |
A61B6/00 |
代理机构 |
|
代理人 |
|
主权项 |
1. An imaging system comprising:
a radiation source configured to emit radiation, a radiation detector including a regular arrangement of detector elements, and a shadow mask with a regularly repeating pattern, wherein the shadow mask and the radiation detector are arranged such that a projection of the pattern of the shadow mask is generated by the radiation at a location of the detector, and wherein a spatial repetition length of the undistorted projection of the pattern deviates from twice a spatial repetition length of the arrangement of the detector elements. |
地址 |
München DE |