Photosensitive polymer compound and photoresist composition containing the same

摘要

A photosensitive polymer is disclosed of formula: wherein R is hydrogen or methyl, R* small Greek eta * is an C 6-20 alicyclic aliphatic hydrocarbon group, R* small Greek omega * is t-butyl or tetrahydropyranyl and A photoresist composition is also disclosed comprising the polymer (II) with a photacid generator. The polymer (II) has high optical transparency at shorter wavelength, a strong etch resistance and excellent adhesiveness. Preferably R 2 is cyclohexyl or alkyltricyclodecanyl.