发明名称 Semiconductor Hall element
摘要 A semiconductor Hall element consists of a substantially rectangular main island and at least one small island of semiconductor material, one conductivity type disposed in an epitaxial semiconductor layer grown on a single crystal semiconductor substrate of the opposite conductivity type. In the main island, a pair of highly doped elongated current terminal regions of the one conductivity type are disposed, so that they are near and substantially parallel to a pair of sides of the main island, which are opposite to each other. At least a highly doped Hall signal voltage terminal semiconductor region of the one conductivity type is disposed in the small island. The Hall signal voltage terminal region has a protrusion having a small cross section, the extremity of which is slightly beyond one side of the main island which is perpendicular to the current terminal regions.
申请公布号 US4028718(A) 申请公布日期 1977.06.07
申请号 US19750626454 申请日期 1975.10.28
申请人 HITACHI, LTD. 发明人 MIGITAKA, MASATOSHI;KANDA, YOZO
分类号 H01L27/22;H01L43/06;(IPC1-7):H01L29/82 主分类号 H01L27/22
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