发明名称 Method for preparing layered structure including oxide superconductor thin film
摘要 <p>The invention provides a method for preparing a layered structure comprising a lower thin film (1) composed of an oxide superconductor and an upper thin film (2) composed of a material different from the oxide superconductor on a substrate. The lower thin film is deposited by a molecular beam deposition process and the upper thin film is deposited by a process having a deposition rate faster than that of the molecular beam deposition process. <IMAGE></p>
申请公布号 EP0824275(A2) 申请公布日期 1998.02.18
申请号 EP19970401900 申请日期 1997.08.07
申请人 SUMITOMO ELECTRIC INDUSTRIES, LIMITED 发明人 NAKAMURA, TAKAO;IIYAMA, MICHITOMO
分类号 H01L39/14;H01L39/24;(IPC1-7):H01L39/24 主分类号 H01L39/14
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