发明名称 |
Method for preparing layered structure including oxide superconductor thin film |
摘要 |
<p>The invention provides a method for preparing a layered structure comprising a lower thin film (1) composed of an oxide superconductor and an upper thin film (2) composed of a material different from the oxide superconductor on a substrate. The lower thin film is deposited by a molecular beam deposition process and the upper thin film is deposited by a process having a deposition rate faster than that of the molecular beam deposition process. <IMAGE></p> |
申请公布号 |
EP0824275(A2) |
申请公布日期 |
1998.02.18 |
申请号 |
EP19970401900 |
申请日期 |
1997.08.07 |
申请人 |
SUMITOMO ELECTRIC INDUSTRIES, LIMITED |
发明人 |
NAKAMURA, TAKAO;IIYAMA, MICHITOMO |
分类号 |
H01L39/14;H01L39/24;(IPC1-7):H01L39/24 |
主分类号 |
H01L39/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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