发明名称 METHOD FOR GROWING SILICON CRYSTAL PLATE, DEVICE THEREFOR, PRODUCTION OF SILICON CRYSTAL PLATE AND MANUFACTURE OF SOLAR CELL ELEMENT
摘要 PROBLEM TO BE SOLVED: To uniformly and continuously grow a very thin silicon crystal plate having a <=200&mu;m thickness. SOLUTION: In this method, a silicon melt 3 is received in a crystal growth crucible 1 whose lower side is provided with a withdrawal port 4 and also, a platelike crystal growth member 5 is placed so that at least a front end 5b of the member 5 is positioned below the withdrawal port 4. Then, the melt 3 withdrawn from the withdrawal port 4 is brought into contact with the front end 5b of the member 5 and pulled downward to grow a silicon crystal plate 7.
申请公布号 JPH1045494(A) 申请公布日期 1998.02.17
申请号 JP19960198967 申请日期 1996.07.29
申请人 NGK INSULATORS LTD 发明人 FUKUDA TSUGUO;IMAEDA MINORU;IMANISHI YUICHIRO
分类号 C30B29/06;C30B15/00;C30B15/08;C30B15/24;H01L31/04 主分类号 C30B29/06
代理机构 代理人
主权项
地址