发明名称 |
METHOD FOR GROWING SILICON CRYSTAL PLATE, DEVICE THEREFOR, PRODUCTION OF SILICON CRYSTAL PLATE AND MANUFACTURE OF SOLAR CELL ELEMENT |
摘要 |
PROBLEM TO BE SOLVED: To uniformly and continuously grow a very thin silicon crystal plate having a <=200μm thickness. SOLUTION: In this method, a silicon melt 3 is received in a crystal growth crucible 1 whose lower side is provided with a withdrawal port 4 and also, a platelike crystal growth member 5 is placed so that at least a front end 5b of the member 5 is positioned below the withdrawal port 4. Then, the melt 3 withdrawn from the withdrawal port 4 is brought into contact with the front end 5b of the member 5 and pulled downward to grow a silicon crystal plate 7. |
申请公布号 |
JPH1045494(A) |
申请公布日期 |
1998.02.17 |
申请号 |
JP19960198967 |
申请日期 |
1996.07.29 |
申请人 |
NGK INSULATORS LTD |
发明人 |
FUKUDA TSUGUO;IMAEDA MINORU;IMANISHI YUICHIRO |
分类号 |
C30B29/06;C30B15/00;C30B15/08;C30B15/24;H01L31/04 |
主分类号 |
C30B29/06 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|