| 摘要 |
PROBLEM TO BE SOLVED: To obtain an aralkyl resin containing salicylic acid residues and specific bisphenol residues in a specific ratio in the molecule, and capable of imparting high resolution and high sensitivity to photoresist resin compositions as an alkali-soluble component. SOLUTION: This salicylic acid-based aralkyl resin has a structure of formula I [X is (A) a salicylic acid residue or (B) 9,9-bis(4-hydroxyphenyl)fluorene residue; (m) is 0-100] and contains the residues A and B in an A/B molar ratio of 99/1 to 50/50 in the structure. The resin is obtained by cocondensing methyl salicylate with 9,9-bis(4-hydroxyphenyl)fluorene in the presence of a compound of formula II (R1 is OH, a 1-4C alkoxy, a halogen) as a condensing agent, distilling off the unreacted methyl salicylate and subsequently hydrolyzing the obtained resin ester with an alkali. |
