发明名称 |
Silica glass member for UV-lithography, method for silica glass production, and method for silica glass member production |
摘要 |
Recent UV-lithography is required to provide a fine and sharp pattern with a line width of 0.5 mu m or less. The present invention provides a silica glass member adapted for use as an optical element for UV-lithography, by giving consideration to the RMS value of wave front aberration and the slant element of refractive index, which have not been considered in the art. Also, there is provided a silica glass member excellent in durability to the ultraviolet irradiation, by introduction of hydrogen molecules at the synthesis of the silica glass, instead of using a secondary treatment for hydrogen introduction.
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申请公布号 |
US5719698(A) |
申请公布日期 |
1998.02.17 |
申请号 |
US19960711471 |
申请日期 |
1996.09.06 |
申请人 |
NIKON CORPORATION |
发明人 |
HIRAIWA, HIROYUKI;TANAKA, ISSEY |
分类号 |
C03B8/04;C03B19/14;C03C3/06;C03C4/00;G02B1/00;G02B13/14;G03F7/20;(IPC1-7):G02B13/14;C03C3/04;C03C8/04 |
主分类号 |
C03B8/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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