| 摘要 |
PROBLEM TO BE SOLVED: To improve the positioning accuracy of a photomask by laying a photomask film having a reference mark pattern and conductor pattern on a photosensitive resin insulation film and setting positioning marks on reference marks of a lower layer recognizable through the photosensitive resin layer and inter-layer insulation layer. SOLUTION: A substrate 1 has a reference mark 2 formed by cutting a circular hole through a part of a conductor surface. An interlayer insulation film is formed on the substrate 1 and dried, a photomask film 4 having circular positioning marks 51 and circular pattern 52a drawn for forming via holes is laid thereon to set the mark 51 to a reference mark 2 which is recognizable through the interlayer insulation layer and provides via-forming holes after positioning. A photosensitive resin layer is the formed. The mark 2 is recognizable through the interlayer insulation layer and photosensitive resin layer, thereby improving the photomask positioning accuracy. |
