SUBSTRATE TREATMENT EQUIPMENT

摘要

PROBLEM TO BE SOLVED: To obtain a substrate treatment equipment which can restrain generation of dust as little as possible when a substrate is carried in a cassette and carried out from it, and improve quality of substrate treatment. SOLUTION: A plurality of cassettes C storing substrates W on multistage are statically mounted on a cassette mounting stand 3. Substrate taking-out mechanism 4 which moves along cassette mounting stand 3 is elevated, thereby taking out a substrate W from the cassette C. The substrate W is subjected to centering, and then delivered to a substrate transfer mechanism 9. A second transfer route wherein the substrate transfer mechanism 9 moves in both directions stretches in the rectangular direction from the center of a first transfer route wherein the substrate taking-out mechanism 4 runs. The substrate transfer mechanism 9 moves on the second transfer route and carried the substrates W to each substrate treatment part. When the substrate W is carried in the cassette C and carried out from it, the cassette C does not move so that generation of dust due to vibration of the cassette C is restrained.