| 摘要 |
PROBLEM TO BE SOLVED: To increase a strength to irradiate a required exposure surface with no increase of a light source strength so as to improve throughput by batch irradiating a required exposure surface so as to focus a big divergent angle in the horizontal direction of a synchrotron radiation light being a sheet form electromagnetic wave. SOLUTION: Synchrotron radiation(SR) light 12 emitted from a light-emitting point 11 at a large angle is reflected by a first mirror 13 and reflected by a second mirror 14 and directed in a direction of a mask 18 followed by going through an opening part of a shutter 16 to irradiate a mask 18, so that the SR light 12 having transmitted the mask 18 irradiates a wafer coated with a resist. The SR light 12 is a sheet-formed electromagnetic wave with a large divergent angle in the horizontal direction and with a small divergent angle in the vertical direction so as to allow the SR light 12 emitted at a large angle inside the horizontal direction for being focused by the first mirror 13 and reflected so as to widen the divergent angle in the vertical direction by a reflection from a second mirror 14 thus allowing batch irradiation of required exposure regions. |
