摘要 |
PROBLEM TO BE SOLVED: To obtain a substrate treatment equipment which can restrain generation of dust as little as possible when a substrate is taken out from a cassette, and improve quality of substrate treatment. SOLUTION: A plurality of cassettes C storing substrates W on multistage are statically mounted on a cassette mounting stand 3. Substrate taking-out mechanism 4 which moves along the cassette mounting stand 3 is elevated, thereby taking out a substrate W from the cassette C. The substrate W is subjected to centering by an alignment mechanism installed in the substrate taking-out mechanism 4, and then delivered to a substrate transfer mechanism 9, which carries the substrate to each substrate treating part of a process unit 2 arranged along a transfer route. When the substrate W is taken out from the cassette C, it does not move so that generation of dust due to vibration of the cassette C is restrained. |