| 摘要 |
PROBLEM TO BE SOLVED: To provide a process for producing an optical waveguide having no high-temp. sintering stage for forming an under clad layer. SOLUTION: After the under clad layer 2 of a glass substrate polished to 80 to 200μm is joined to an Si substrate 5, the substrate is heated to 200 to 500 deg.C and glass particulates are deposited on the surface of the glass substrate and thereafter, the glass particulates are sintered by heating at 1200 to 1350 deg.C. The remaining parts are then removed exclusive of waveguide patterns, by which core layers 3 are formed. Glass particulates are deposited thereon and thereafter, the particulates are subjected to a heat treatment to form the over clad layer 4 to obtain the optical waveguide 1. |
