| 摘要 |
PROBLEM TO BE SOLVED: To obtain a photoresist treatment equipment which can restrain generation of dust as little as possible when a substrate is carried in a cassette or carried out form it, and improve equality of substrate treatment. SOLUTION: A plurality of cassettes C storing substrates W on multistage are statically mounted on a cassette mounting stand 3. Substrate taking-out mechanism 4 which moves along the cassette mounting stand 3 is elevated, thereby taking out a substrate W from the cassette C. The substrate W is subjected to centering by an alignment mechanism which moves together with the substrate taking-out mechanism 4, and then delivered to a substrate transfer mechanism 9, which carries the substrate W to spinner parts 111 , 112 and heat treatment parts 121 -122 of a process unit 2. When the substrate W is carried in the cassette C or carried out from it, the cassette C does not move so that generation of dust due to vibration of the cassette C is restrained. |
