METHOD FOR TREATING SEMICONDUCTOR MATERIAL

摘要

PROBLEM TO BE SOLVED: To make the cleaning treatment of a semiconductor material simpler and more effective by causing cavitation in a liquid bath. SOLUTION: A container filled up with a semiconductor material 1 is dipped in a liquid batch 10. One row of nozzles 5 which are arranged in the form of a grid and connected to a pump 7 is arranged below the container 2. The pump 7 sends a liquid to the liquid batch 10 with pressure from a tank 3 through the nozzles 5. The nozzles 5 are formed so that cavitation can be caused in liquid jets 4 discharged from the nozzles 5. The semiconductor material 1 is set in the working area of the liquid jets 4. A liquid for operating the nozzles 5 is sucked from the tank 3 and supplied to the pump 7 through a filter 6. Therefore, contaminants can be removed effectively.