发明名称 Alignment apparatus and exposure apparatus equipped with same
摘要 A heterodyne interference-type alignment sensor that permits the high-precision matching of detection light eams to suit the pitch of the diffraction grating marks to be detected without introducing undue complexity to the optical system. Light beams L0 of a given wideband width are illuminated onto an acousto-optical modulator to obtain light beams L1 (1), L2 (-1) comprising +/- 1st order beams, which are further directed to diffraction grating marks RM, WM via a relay optical system. The diffracted beams from diffraction grating marks RM, WM are detected by photoelectric detectors. The frequencies f1, f2, applied to the acousto-optical modulator are varied while maintaining a correspondence between the difference between frequencies f1, f2 and the pitch of diffraction grating marks RM, WM. <IMAGE> <IMAGE>
申请公布号 EP0823667(A2) 申请公布日期 1998.02.11
申请号 EP19970113575 申请日期 1997.08.06
申请人 NIKON CORPORATION 发明人 MIZUTANI, HIDEO;KAWAGUCHI, TORU
分类号 G03F7/20;G03F9/00;(IPC1-7):G03F9/00 主分类号 G03F7/20
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