发明名称 Gas filling method and facility
摘要 <p>A gas filling facility and method in which the purity of a gas to be filled is restrained from lowering, are provided. In a gas filling facility 10 according to the present invention, it is destined that the connection of a gas supply pipe 44 and a gas filling pipe 28 attached on gas containers 12 is performed in an exclusive clean room 42 and the storage of the gas filling pipe 28 is performed in another clean room 26. It is therefore possible to attempt the down-sizing of these clean rooms in volume, and it is enabled to enhance the degree of cleanness of each clean room. Even if the inside of the gas filling pipe 28 is exposed to air in the clean room when handling the same gas filling pipe 28, accordingly, such a danger that floating particles invade thereinto is reduced. Since it is destined that when the gas filling pipe is stored, ultra- high purity nitrogen gas is caused to flow through the inside thereof, furthermore, according to the present invention, the inside of the gas filling pipe for use in the gas filling can be kept under an extremely clean state. By virtue of this fact, it becomes also possible to prevent the gas purity from lowering. <IMAGE></p>
申请公布号 EP0823584(A1) 申请公布日期 1998.02.11
申请号 EP19970202415 申请日期 1997.08.01
申请人 TEISAN KABUSHIKI KAISHA 发明人 TAKEHARADA, MITSUHIDE;NOZAWA, SHIEGEYOSHI
分类号 H01L21/02;F17C5/06;F17C13/04;(IPC1-7):F17C5/06 主分类号 H01L21/02
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