Sulfonic acid esters, radiation-sensitive mixtures prepared therewith and their use

摘要

PCT No. PCT/EP93/02701 Sec. 371 Date May 30, 1995 Sec. 102(e) Date May 30, 1995 PCT Filed Oct. 4, 1993 PCT Pub. No. WO94/18606 PCT Pub. Date Aug. 18, 1994Sulfonic acid esters are used as (a) compounds for forming a strong acid on irradiation in radiation-sensitive, positive or negative working mixtures also comprising (b) either a compound with at least one acid-decomposable C-O-C or C-O-Si bond (for positive working mixtures) or a compound with at least acid-cross-linkable groups (for negative working mixtures) and c) a binder which is insoluble in water but soluble or at least swellable in aqueous alkaline solutions, wherein said sulfonic acid esters are formula[R1-CR2(CF3)-O-SO2-]nR3(I)orR1[-CR2(CF3)-O-SO2-R3]m(II)wherein R1, R2, R3, n and n are defined with the body of the disclosure. These mixtures are particularly suitable for exposure to deep UV radiation in the formation of recording materials suitable for the production of photoresists, electronic components, and printing plates.