发明名称 AUTOMATICALLY TREATING DEVICE FOR SEMICONDUCTOR
摘要 PROBLEM TO BE SOLVED: To prevent the corrosion of driving devices and to lessen the generation of dust by providing the treating device with a partition provided with oblong holes through which a transporting device can move and sealing these oblong holes with a sealing film induced to avert a sealing plate through which the transporting devices pass and the transporting devices, thereby isolating a treating chamber and the driving devices. SOLUTION: The treating chamber which is installed with a washing tank and a drying device and the driving devices 14 are partitioned by a partition plate 16. This partition plate 16 is provided with openings 17 in such a manner that wafer carrier clamping devices 9, 12 clamping wafer carriers 4 are able to move laterally and vertically. The oblong holes through which the transporting shafts 8 of the transporting device 6 and the transporting shafts 8 of the transporting device 11 pass are formed. The oblong holes are sealed by the sealing film 21 guided by the sealing plates 19 and guide rollers 20 so as to avert the transporting devices 6, 11. One end of the sealing film 21 is fixed by a fixing section 22 and the other end is hung by a weight 23. As a result, the corrosion of the driving devices is prevented and the generation of the dust by the movement of the transporting devices is obviated.
申请公布号 JPH1034062(A) 申请公布日期 1998.02.10
申请号 JP19960213286 申请日期 1996.07.25
申请人 OSHIDARI KENKYUSHO:KK 发明人 ONOZAWA RYOHEI
分类号 B05C9/10;B05C13/00;H01L21/02;H01L21/677;H01L21/68;(IPC1-7):B05C13/00 主分类号 B05C9/10
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