发明名称 METHOD FOR APPLICATION OF LIQUID TO SUBSTRATE
摘要 FIELD: photographic industry, in particular, for application of light- sensitive emulsion on paper, other industrial processes which require uniform application of liquid to substrate. SUBSTANCE: method involves pulling substrate through tray with liquid, filling tray with metal which has low melting temperature, for example with Wood alloy, heating it up to melting temperature, exciting fading surface waves on surface of liquid metal, supply of liquid to concave regions of waves, keeping substrate on tray surface by means of pressing substrate to support plane using ridges of surface waves of liquid metal. Liquid, for example, light-sensitive emulsion, fills concave regions of waves, is driven by waves and is applied to substrate in layers in points of contact of filled concave regions and substrate. While amplitude of waves fades and emulsion in concave regions is used, total amount of emulsion fills substrate. Movement of emulsion by means of surface waves and multiple application of emulsion to substrate leads to increased efficiency of process and increased uniformity of layer. EFFECT: increased quality of layer, increased efficiency of process. 2 cl, 1 dwg øøø1
申请公布号 RU2104579(C1) 申请公布日期 1998.02.10
申请号 RU19950114094 申请日期 1995.08.08
申请人 LITSEJ N 142 G.KRASNOJARSKA 发明人 DMITRIEV S.A.;KARPUSHENKO R.P.;SHEVJAKIN A.P.;DMITRIEV S.A.;KARPUSHENKO R.P.;SHEVJAKIN A.P.
分类号 G03C1/74;(IPC1-7):G03C1/74 主分类号 G03C1/74
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