发明名称 |
Programmable method and apparatus for cleaning semiconductor elements |
摘要 |
Method and apparatus for cleaning a workpiece such as a semiconductor element in which the element is placed on a chuck mounted on a rotation mechanism in which the rotation mechanism rotates around a first axis, and the element to be cleaned rotates around a second axis spaced from the first axis in a planetary manner. The cleaning process is programmed such that the element may be sprayed, immersed for a soak or pre-soak step, immersed while spinning, sprayed while spinning, and dried by heated gas, or any combination of these. The cleaning program is performed in a single chamber, which may be heated to a desired temperature.
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申请公布号 |
US5715610(A) |
申请公布日期 |
1998.02.10 |
申请号 |
US19950430034 |
申请日期 |
1995.04.27 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
SMITH, JR., WILLIAM CHARLES;LORD, DONN ALLAN |
分类号 |
B08B3/02;B08B3/04;B08B11/02;H01L21/00;H01L21/687;(IPC1-7):F26B17/24 |
主分类号 |
B08B3/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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