发明名称 |
Positive-working quinone diazide resist composition containing organic phosphoric compound and an amine and process for the formation of fine pattern using same |
摘要 |
A positive-working photosensitive composition comprises: (1) an alkali-soluble resin; (2) a quinonediazide compound; (3) an organic phosphoric compound; and (4) at least one of a phenylenediamine compound and a derivative thereof, 2-amino-1-phenylethanol, N-phenyldiethanolamine, N-phenylethanolamine, N-ethyldiethanolamine, and N-ethylethanolamine. The resist composition exhibits so higher an adhesion to a substrate than ever as to provide an enhanced accuracy in processing during etching, enabling subsequent faithful transfer of a finer pattern to the substrate.
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申请公布号 |
US5716753(A) |
申请公布日期 |
1998.02.10 |
申请号 |
US19960675056 |
申请日期 |
1996.07.03 |
申请人 |
FUJI PHOTO FILM CO., LTD.;FUJI FILM OLIN CO., LTD. |
发明人 |
YOSHIMOTO, HIROSHI;SUZUKI, NOBUO;ISHII, WATARU;KATOH, SHINYA;MATSUURA, HIROAKI |
分类号 |
G03F7/022;G03F7/029;G03F7/085;H01L21/027;(IPC1-7):G03F7/023 |
主分类号 |
G03F7/022 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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