发明名称 ULTRAFINE PARTICLE DISPERSED MATERIAL OF SEMICONDUCTOR AND ITS PRODUCTION
摘要 PROBLEM TO BE SOLVED: To obtain an intermediate material excellent in stability, mass productivity and handleability, comprising ultrafine particles of semiconductor improved in dispersibility. SOLUTION: Ultrafine particles of semiconductor during synthesis in the presence of a metal compound and a monomer are irradiated with light rays to produce a dispersion of the ultrafine particles of semiconductor, which is mixed with a polymer or a solution of a polymer to give a solution. This solution is mixed with a solvent which is a poor solvent to the polymer but is a good solvent to the metal compound to settle a precipitate. The precipitate is filtered off and dried under reduced pressure to give the objective ultrafine particles dispersed material of semiconductor.
申请公布号 JPH1036517(A) 申请公布日期 1998.02.10
申请号 JP19960199020 申请日期 1996.07.29
申请人 AGENCY OF IND SCIENCE & TECHNOL;MITSUI PETROCHEM IND LTD 发明人 MIZUMA KOICHI;HAYASHI TOYOJI;KAWASEKI TAKASHI;HIRAGA TAKASHI;MORIYA TETSUO
分类号 G02F1/35;C08F2/44;C08F2/46;C08F2/48;C08J3/14;G02F1/355;(IPC1-7):C08J3/14 主分类号 G02F1/35
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