发明名称 |
ULTRAFINE PARTICLE DISPERSED MATERIAL OF SEMICONDUCTOR AND ITS PRODUCTION |
摘要 |
PROBLEM TO BE SOLVED: To obtain an intermediate material excellent in stability, mass productivity and handleability, comprising ultrafine particles of semiconductor improved in dispersibility. SOLUTION: Ultrafine particles of semiconductor during synthesis in the presence of a metal compound and a monomer are irradiated with light rays to produce a dispersion of the ultrafine particles of semiconductor, which is mixed with a polymer or a solution of a polymer to give a solution. This solution is mixed with a solvent which is a poor solvent to the polymer but is a good solvent to the metal compound to settle a precipitate. The precipitate is filtered off and dried under reduced pressure to give the objective ultrafine particles dispersed material of semiconductor. |
申请公布号 |
JPH1036517(A) |
申请公布日期 |
1998.02.10 |
申请号 |
JP19960199020 |
申请日期 |
1996.07.29 |
申请人 |
AGENCY OF IND SCIENCE & TECHNOL;MITSUI PETROCHEM IND LTD |
发明人 |
MIZUMA KOICHI;HAYASHI TOYOJI;KAWASEKI TAKASHI;HIRAGA TAKASHI;MORIYA TETSUO |
分类号 |
G02F1/35;C08F2/44;C08F2/46;C08F2/48;C08J3/14;G02F1/355;(IPC1-7):C08J3/14 |
主分类号 |
G02F1/35 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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