发明名称 |
Focal plane phase-shifting lithography |
摘要 |
A lithographic system for patterned exposure of radiation-sensitive resist comprises a radiation source, a mask, a converging optical element having a focal plane, and a phase-shifting optical element disposed at the focal plane of the converging optical element. The lithographic system produces enhanced images.
|
申请公布号 |
US5717218(A) |
申请公布日期 |
1998.02.10 |
申请号 |
US19940365279 |
申请日期 |
1994.12.28 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
COUFAL, HANS JUERGEN;GRYGIER, ROBERT KEITH |
分类号 |
G03F7/20;(IPC1-7):G21K5/00 |
主分类号 |
G03F7/20 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|