发明名称 METAL SUBSTRATE WITH AN OXIDE LAYER AND AN IMPROVED ANCHORING LAYER
摘要 <p>An anchoring layer is disposed on a surface of a substrate. The substrate is capable to develop a first oxide on the surface and tightly bonded thereto, the first oxide comprising a first metallic element. Alternatively, the surface is formed of the first oxide. The anchoring layer is formed with a ternary oxide of the first metallic element, a second metallic element and oxygen. A second oxide layer, which contains an oxide of the second metallic element, is disposed on the anchoring layer. The anchoring layer is formed on the substrate in a series of process steps, which include: establishing an atmosphere containing oxygen around the articles; evaporating a compound of the first metallic element and a compound of the other metallic element into the atmosphere and forming a ternary gas phase containing the first metallic element, the second metallic element and the oxygen; and precipitating the ternary gas phase on the article.</p>
申请公布号 WO1998004759(A1) 申请公布日期 1998.02.05
申请号 EP1996003287 申请日期 1996.07.25
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