发明名称 Gallium arsenide metal semiconductor FET for HF communications system
摘要 The semiconductor component has a semiconductor substrate (1) with an upper side. The component also has a recess (3) with a lower surface and side surfaces arranged on the upper side of the substrate. The component has an n-type region (5) of lower concentration arranged in part of the substrate directly below the lower side of the recess. The n-type region extends over the whole width of the recess lower side. The component also has n-type regions (9a,9b) of higher concentration. The n-type regions of higher concentration are arranged in parts of the substrate adjacent the lower concentration n-type region. The component also has a gate electrode (7) made of high melt metal and is arranged in the recess adjacent to the lower concentration n-type region. Ohmic electrodes (10a,b) are each arranged on respective n-type regions of higher concentration.
申请公布号 DE19723937(A1) 申请公布日期 1998.02.05
申请号 DE19971023937 申请日期 1997.06.06
申请人 MITSUBISHI DENKI K.K., TOKIO/TOKYO, JP 发明人 ITO, KAZUHIKO, TOKIO/TOKYO, JP
分类号 H01L29/41;H01L21/265;H01L21/285;H01L21/338;H01L29/47;H01L29/812;H01L29/872;(IPC1-7):H01L29/812 主分类号 H01L29/41
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