| 摘要 |
This invention relates to a gas scrubber and methods of disposing a gas by using same. The gas produced during the manufacturing of the semiconductor is supplied to a burner through a gas intake tube. Initial purification process occurs when flammable and harmful components of the gas are burned in the burner. The gas initially is treated in the burner and then flows into the adsorbent device. A multiple layers of catalytic adsorbent materials are placed in an adsorbent device to physically and chemically treat the gas. The gas is distributed in order from the bottom the catalytic adsorbent materials to the top level. Depending upon a pressure difference between the supplied gas and discharged gas, or the density of harmful components within the discharged gas, the gas is distributed to pass through next catalytic adsorbent materials. |
