发明名称 DECOMPOSITION OF HALIDE GAS
摘要 PROBLEM TO BE SOLVED: To provide a decomposition method advantageous from aspect on the structure and material quality of an apparatus by highly efficiently decomposing and detoxifying a halide gas containing oxygen at low temp. SOLUTION: When a halide gas and a mixture containing 0.05-40wt.% of potassium hydroxide and an alkaline earth metal oxide or an alkaline earth metal hydroxide are brought to catalytic reaction, as pretreatment, the halide gas is brought into contact with one of activated carbon, an iron powder and a nickel powder within a temp. range of 500-900 deg.C or the halide gas is brought into contact with a mixture containing 0.05-40wt.% of potassium hydroxide, an alkaline earth metal oxide or an alkaline earth metal hydroxide and a component selected from activated carbon, an iron powder and a nickel powder at 500-900 deg.C. A halide gas coexisting along with oxygen is brought into contact with an element selected from a group consisting of Si, Ti, Ge, W, Mo, Fe, Mn, Co, Zn, Sn, B and Zr and a nonoxide compd. thereof at 300-800 deg.C.
申请公布号 JPH1028839(A) 申请公布日期 1998.02.03
申请号 JP19960190983 申请日期 1996.07.19
申请人 CENTRAL GLASS CO LTD 发明人 NAKANO HISAHARU;MATSUOKA NOBUHIKO;UEDA TETSUO;NAKAGAWA SHINSUKE
分类号 B01D53/46;B01D53/86;B01J20/02;B01J20/20;B01J23/02 主分类号 B01D53/46
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